Plasma Chemistry And Plasma Processing

Plasma Chemistry And Plasma Processing英文简介

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

Plasma Chemistry And Plasma Processing中文简介

《Plasma Chemistry And Plasma Processing》是一本由SPRINGER出版商出版的专业工程技术期刊，该刊创刊于1981年，刊期Quarterly，该刊已被国际权威数据库SCIE、SCI收录。在中科院最新升级版分区表中，该刊分区信息为大类学科：工程技术 3区，小类学科：工程：化工 3区；物理：应用 3区；物理：流体与等离子体 3区；在JCR（Journal Citation Reports）分区等级为Q2。该刊发文范围涵盖工程：化工等领域，旨在及时、准确、全面地报道国内外工程：化工工作者在该领域取得的最新研究成果、工作进展及学术动态、技术革新等，促进学术交流，鼓励学术创新。2021年影响因子为3.337，平均审稿速度较慢,6-12周。

中科院分区最新升级版（当前数据版本：2021年12月最新升级版）

大类学科	分区	小类学科	分区	Top期刊	综述期刊
工程技术	3区	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：应用 PHYSICS, FLUIDS & PLASMAS 物理：流体与等离子体	3区 3区 3区	否	否

JCR分区（当前数据版本：2021-2022年最新版）

JCR分区等级	JCR所属学科	分区	影响因子
Q2	PHYSICS, FLUIDS & PLASMAS	Q2	3.337
	PHYSICS, APPLIED	Q2
	ENGINEERING, CHEMICAL	Q2

期刊指数

影响因子	h-index	Gold OA文章占比	研究类文章占比	OA开放访问	平均审稿速度
3.337	57	7.53%	93.24%	未开放	较慢,6-12周

IF值(影响因子)趋势图